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Isothermal H~2 desorption kinetics from Si(100)2 x 1: dependence on disilane and atomic hydrogen precursors
Isothermal H~2 desorption kinetics from Si(100)2 x 1: dependence on disilane and atomic hydrogen precursors
Isothermal H~2 desorption kinetics from Si(100)2 x 1: dependence on disilane and atomic hydrogen precursors
Okada, L. A. (author) / Wise, M. L. (author) / George, S. M. (author)
APPLIED SURFACE SCIENCE ; 82/83 ; 410
1994-01-01
410 pages
Article (Journal)
Unknown
DDC:
621.35
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