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Isothermal H~2 desorption kinetics from Si(100)2 x 1: dependence on disilane and atomic hydrogen precursors
Isothermal H~2 desorption kinetics from Si(100)2 x 1: dependence on disilane and atomic hydrogen precursors
Isothermal H~2 desorption kinetics from Si(100)2 x 1: dependence on disilane and atomic hydrogen precursors
Okada, L. A. (Autor:in) / Wise, M. L. (Autor:in) / George, S. M. (Autor:in)
APPLIED SURFACE SCIENCE ; 82/83 ; 410
01.01.1994
410 pages
Aufsatz (Zeitschrift)
Unbekannt
DDC:
621.35
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