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    Unintentional incorporation of contaminants during chemical vapour deposition of silicon carbide

    New search for: Karmann, S.
    New search for: Di Cioccio, L.
    New search for: Blanchard, B.
    New search for: Ouisse, T.
    New search for: Fricke, K.
    New search for: Krozer, V.

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    Unintentional incorporation of contaminants during chemical vapour deposition of silicon carbide

    New search for: Karmann, S.
    New search for: Di Cioccio, L.
    New search for: Blanchard, B.
    New search for: Ouisse, T.
    New search for: Fricke, K.
    New search for: Krozer, V.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Unintentional incorporation of contaminants during chemical vapour deposition of silicon carbide

    New search for: Karmann, S.
    New search for: Di Cioccio, L.
    New search for: Blanchard, B.
    New search for: Ouisse, T.
    New search for: Fricke, K.
    New search for: Krozer, V.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Unintentional incorporation of contaminants during chemical vapour deposition of silicon carbide

    Contributors:

    Karmann, S. (author) / Di Cioccio, L. (author) / Blanchard, B. (author) / Ouisse, T. (author) / Fricke, K. / Krozer, V.

    Published in:

    High Temperature Electronics: Materials Devices Applications ; 134

    MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 29

    Publication date:

    1995-01-01

    Size:

    134 pages

    ISSN:

    0921-5107

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    Unknown

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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