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Macrodefect formation in semiconductors during high energy ion implantation: Monte Carlo simulation of damage depth distributions
Macrodefect formation in semiconductors during high energy ion implantation: Monte Carlo simulation of damage depth distributions
Macrodefect formation in semiconductors during high energy ion implantation: Monte Carlo simulation of damage depth distributions
Fedotov, S. A. (author) / Varichenko, V. S. (author) / Zaitsev, A. M. (author) / Ishimaru, M. (author) / Fricke, K. / Krozer, V.
1995-01-01
202 pages
Article (Journal)
Unknown
DDC:
620.11
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