Fachinformationsdienst BAUdigital

A platform for research: civil engineering, architecture and urbanism

    In-situ spectroscopic ellipsometry to control the growth of Ti nitride and carbide thin films

    New search for: Logothetidis, S.
    New search for: Alexandrou, I.
    New search for: Stoemenos, J.
    New search for: Dieleman, J.
    New search for: Biermann, U. K. P.
    New search for: Hess, P.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    In-situ spectroscopic ellipsometry to control the growth of Ti nitride and carbide thin films

    New search for: Logothetidis, S.
    New search for: Alexandrou, I.
    New search for: Stoemenos, J.
    New search for: Dieleman, J.
    New search for: Biermann, U. K. P.
    New search for: Hess, P.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    In-situ spectroscopic ellipsometry to control the growth of Ti nitride and carbide thin films

    New search for: Logothetidis, S.
    New search for: Alexandrou, I.
    New search for: Stoemenos, J.
    New search for: Dieleman, J.
    New search for: Biermann, U. K. P.
    New search for: Hess, P.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    In-situ spectroscopic ellipsometry to control the growth of Ti nitride and carbide thin films

    Contributors:

    Logothetidis, S. (author) / Alexandrou, I. (author) / Stoemenos, J. (author) / Dieleman, J. / Biermann, U. K. P. / Hess, P.

    Published in:

    Photon-Assisted Processing of Surfaces and Thin Films ; 185

    APPLIED SURFACE SCIENCE ; 86

    Publication date:

    1995-01-01

    Size:

    185 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    Unknown

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

    Similar titles

    In situ control of SiOx composition by spectroscopic ellipsometry

    Gallas, B. / Kao, C. C. / Fisson, S. et al. | British Library Online Contents | 2003

    Albumin adsorption on oxide thin films studied by spectroscopic ellipsometry

    Silva-Bermudez, P. / Rodil, S. E. / Muhl, S. | British Library Online Contents | 2011

    Spectroscopic ellipsometry

    British Library Online Contents | 2005

    Temperature dependence of Mn1.56Co0.96Ni0.48O4 thin films optical properties by spectroscopic ellipsometry

    Ma, C. / Wang, H. G. / Zhao, P. J. et al. | British Library Online Contents | 2014

    Probing initial-stages of ALD growth with dynamic in situ spectroscopic ellipsometry

    Muneshwar, T. / Cadien, K. | British Library Online Contents | 2015

    Back to top