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Interstitials in Silicon Produced by Electron Beam Doping (Superdiffusion)

Wada, T. / Hagino, T. / Fujimoto, H. / Masuda, H.

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Interstitials in Silicon Produced by Electron Beam Doping (Superdiffusion)

Wada, T. / Hagino, T. / Fujimoto, H. / Masuda, H.

Interstitials in Silicon Produced by Electron Beam Doping (Superdiffusion)

Wada, T. / Hagino, T. / Fujimoto, H. / Masuda, H.

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Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Interstitials in Silicon Produced by Electron Beam Doping (Superdiffusion)

Contributors:

Wada, T. (author) / Hagino, T. (author) / Fujimoto, H. (author) / Masuda, H. (author)

Published in:

MATERIALS SCIENCE FORUM ; 1613-1618

Publication date:

1995-01-01

Size:

6 pages

ISSN:

0255-5476

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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