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Oxygen precipitate precursors and size thresholds for the preferential nucleation for copper and nickel precipitation in silicon: the detection of copper and nickel contamination by minority carrier lifetimes methods
Oxygen precipitate precursors and size thresholds for the preferential nucleation for copper and nickel precipitation in silicon: the detection of copper and nickel contamination by minority carrier lifetimes methods
Oxygen precipitate precursors and size thresholds for the preferential nucleation for copper and nickel precipitation in silicon: the detection of copper and nickel contamination by minority carrier lifetimes methods
Bazzali, A. (author) / Borionetti, G. (author) / Orizio, R. (author) / Gambaro, D. (author) / Falster, R. (author)
MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 36 ; 85-90
1996-01-01
6 pages
Article (Journal)
English
DDC:
620.11
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