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Oxygen precipitate precursors and size thresholds for the preferential nucleation for copper and nickel precipitation in silicon: the detection of copper and nickel contamination by minority carrier lifetimes methods
Oxygen precipitate precursors and size thresholds for the preferential nucleation for copper and nickel precipitation in silicon: the detection of copper and nickel contamination by minority carrier lifetimes methods
Oxygen precipitate precursors and size thresholds for the preferential nucleation for copper and nickel precipitation in silicon: the detection of copper and nickel contamination by minority carrier lifetimes methods
Bazzali, A. (Autor:in) / Borionetti, G. (Autor:in) / Orizio, R. (Autor:in) / Gambaro, D. (Autor:in) / Falster, R. (Autor:in)
MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 36 ; 85-90
01.01.1996
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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