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    Chemical vapour deposition of thin copper films using a new metalorganic precursor

    New search for: Goswami, J.
    New search for: Raghunathan, L.
    New search for: Devi, A.
    New search for: Shivashankar, S. A.
    New search for: Chandrasekaran, S.

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    Chemical vapour deposition of thin copper films using a new metalorganic precursor

    New search for: Goswami, J.
    New search for: Raghunathan, L.
    New search for: Devi, A.
    New search for: Shivashankar, S. A.
    New search for: Chandrasekaran, S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Chemical vapour deposition of thin copper films using a new metalorganic precursor

    New search for: Goswami, J.
    New search for: Raghunathan, L.
    New search for: Devi, A.
    New search for: Shivashankar, S. A.
    New search for: Chandrasekaran, S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Chemical vapour deposition of thin copper films using a new metalorganic precursor

    Contributors:

    Goswami, J. (author) / Raghunathan, L. (author) / Devi, A. (author) / Shivashankar, S. A. (author) / Chandrasekaran, S. (author)

    Published in:

    JOURNAL OF MATERIALS SCIENCE LETTERS ; 15 ; 573-575

    Publication date:

    1996-01-01

    Size:

    3 pages

    ISSN:

    0261-8028

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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