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    Copper thin films prepared by chemical vapour deposition from copper dipivalylmethanate

    New search for: Maruyama, T.
    New search for: Ikuta, Y.

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    Copper thin films prepared by chemical vapour deposition from copper dipivalylmethanate

    New search for: Maruyama, T.
    New search for: Ikuta, Y.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Copper thin films prepared by chemical vapour deposition from copper dipivalylmethanate

    New search for: Maruyama, T.
    New search for: Ikuta, Y.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Copper thin films prepared by chemical vapour deposition from copper dipivalylmethanate

    Contributors:

    Maruyama, T. (author) / Ikuta, Y. (author)

    Published in:

    JOURNAL OF MATERIALS SCIENCE ; 28 ; 5540

    Publication date:

    1993-01-01

    Size:

    5540 pages

    ISSN:

    0022-2461

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    Unknown

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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