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Very low temperature polycrystalline silicon films with very large grains deposited for thin film transistor applications
Very low temperature polycrystalline silicon films with very large grains deposited for thin film transistor applications
Very low temperature polycrystalline silicon films with very large grains deposited for thin film transistor applications
Wang, K. C. (author) / Yew, T. R. (author) / Hwang, H. L. (author)
APPLIED SURFACE SCIENCE ; 92 ; 99-105
1996-01-01
7 pages
Article (Journal)
English
DDC:
621.35
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