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Optimisation of doped microcrystalline silicon films deposited at very low temperatures by hot-wire CVD

Voz, C. / Peiro, D. / Bertomeu, J. / Soler, D. / Fonrodona, M. / Andreu, J.

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Optimisation of doped microcrystalline silicon films deposited at very low temperatures by hot-wire CVD

Voz, C. / Peiro, D. / Bertomeu, J. / Soler, D. / Fonrodona, M. / Andreu, J.

Optimisation of doped microcrystalline silicon films deposited at very low temperatures by hot-wire CVD

Voz, C. / Peiro, D. / Bertomeu, J. / Soler, D. / Fonrodona, M. / Andreu, J.

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Access via TIB

Check availability in my library

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Document information

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Document information

Title:

Optimisation of doped microcrystalline silicon films deposited at very low temperatures by hot-wire CVD

Contributors:

Voz, C. (author) / Peiro, D. (author) / Bertomeu, J. (author) / Soler, D. (author) / Fonrodona, M. (author) / Andreu, J. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 69-70 ; 278 - 283

Publication date:

2000-01-01

Size:

6 pages

ISSN:

0921-5107

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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