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Properties of radio frequency magnetron sputtered silicon dioxide films

Wu, W.-F. / Chiou, B.-S.

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Properties of radio frequency magnetron sputtered silicon dioxide films

Wu, W.-F. / Chiou, B.-S.

Properties of radio frequency magnetron sputtered silicon dioxide films

Wu, W.-F. / Chiou, B.-S.

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Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Properties of radio frequency magnetron sputtered silicon dioxide films

Contributors:

Wu, W.-F. (author) / Chiou, B.-S. (author)

Published in:

APPLIED SURFACE SCIENCE ; 99 ; 237-243

Publication date:

1996-01-01

Size:

7 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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