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    Growth kinetics of thermal oxidation process on Si(100) by real time ultraviolet photoelectron spectroscopy

    New search for: Enta, Y.
    New search for: Takegawa, Y.
    New search for: Suemitsu, M.
    New search for: Miyamoto, N.

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    Growth kinetics of thermal oxidation process on Si(100) by real time ultraviolet photoelectron spectroscopy

    New search for: Enta, Y.
    New search for: Takegawa, Y.
    New search for: Suemitsu, M.
    New search for: Miyamoto, N.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Growth kinetics of thermal oxidation process on Si(100) by real time ultraviolet photoelectron spectroscopy

    New search for: Enta, Y.
    New search for: Takegawa, Y.
    New search for: Suemitsu, M.
    New search for: Miyamoto, N.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Growth kinetics of thermal oxidation process on Si(100) by real time ultraviolet photoelectron spectroscopy

    Contributors:

    Enta, Y. (author) / Takegawa, Y. (author) / Suemitsu, M. (author) / Miyamoto, N. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 99 ; 449-453

    Publication date:

    1996-01-01

    Size:

    5 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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