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Infrared study of chemistry of Si surfaces in etching solution

Niwano, M. / Miura, T. / Tajima, R. / Miyamoto, N.

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Infrared study of chemistry of Si surfaces in etching solution

Niwano, M. / Miura, T. / Tajima, R. / Miyamoto, N.

Infrared study of chemistry of Si surfaces in etching solution

Niwano, M. / Miura, T. / Tajima, R. / Miyamoto, N.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Infrared study of chemistry of Si surfaces in etching solution

Contributors:

Niwano, M. (author) / Miura, T. (author) / Tajima, R. (author) / Miyamoto, N. (author)

Published in:

APPLIED SURFACE SCIENCE ; 99 ; 607-611

Publication date:

1996-01-01

Size:

5 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

Niwano, M. / Miura, T.-A. / Tajima, R. et al. | British Library Online Contents | 1996

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