Infrared and Raman study of H-terminated Si(100) surfaces produced by etching solutions: Fid-Bau Portal

Infrared and Raman study of H-terminated Si(100) surfaces produced by etching solutions

Miyata, N. / Watanabe, S. / Okamura, S.

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Infrared and Raman study of H-terminated Si(100) surfaces produced by etching solutions

Miyata, N. / Watanabe, S. / Okamura, S.

Infrared and Raman study of H-terminated Si(100) surfaces produced by etching solutions

Miyata, N. / Watanabe, S. / Okamura, S.

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Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Infrared and Raman study of H-terminated Si(100) surfaces produced by etching solutions

Contributors:

Miyata, N. (author) / Watanabe, S. (author) / Okamura, S. (author)

Published in:

APPLIED SURFACE SCIENCE ; 117/118 ; 26-31

Publication date:

1997-01-01

Size:

6 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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