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Structure and electrical properties of thin copper films deposited by MOCVD
Structure and electrical properties of thin copper films deposited by MOCVD
Structure and electrical properties of thin copper films deposited by MOCVD
Roeber, J. (author) / Kaufmann, C. (author) / Gessner, T. (author) / Gessner, T / Schulz, S. E.
1996-01-01
5 pages
Article (Journal)
English
DDC:
621.35
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