Effects of Ne^+ implantation and rapid thermal annealing on the microstructure and electrical properties of YBCO thin films: Fid-Bau Portal

Effects of Ne^+ implantation and rapid thermal annealing on the microstructure and electrical properties of YBCO thin films

Li, Y. H. / Staton-Bevan, A. E. / Tate, T. J. / Lee, M. J. / Li, Y. / Kilner, J. A. / Somekh, R. E.

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Effects of Ne^+ implantation and rapid thermal annealing on the microstructure and electrical properties of YBCO thin films

Li, Y. H. / Staton-Bevan, A. E. / Tate, T. J. / Lee, M. J. / Li, Y. / Kilner, J. A. / Somekh, R. E.

Effects of Ne^+ implantation and rapid thermal annealing on the microstructure and electrical properties of YBCO thin films

Li, Y. H. / Staton-Bevan, A. E. / Tate, T. J. / Lee, M. J. / Li, Y. / Kilner, J. A. / Somekh, R. E.

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Document information

Title:

Effects of Ne^+ implantation and rapid thermal annealing on the microstructure and electrical properties of YBCO thin films

Contributors:

Li, Y. H. (author) / Staton-Bevan, A. E. (author) / Tate, T. J. (author) / Lee, M. J. (author) / Li, Y. (author) / Kilner, J. A. (author) / Somekh, R. E. (author)

Published in:

JOURNAL OF MATERIALS SCIENCE LETTERS ; 15 ; 1836-1838

Publication date:

1996-01-01

Size:

3 pages

ISSN:

0261-8028

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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