IR laser induced CVD of SiO~2 phases from triethoxysilane and tetraethoxysilane: Fid-Bau Portal

IR laser induced CVD of SiO~2 phases from triethoxysilane and tetraethoxysilane

Drinek, V. / Bastl, Z. / Subrt, J. / Pola, J.

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IR laser induced CVD of SiO~2 phases from triethoxysilane and tetraethoxysilane

Drinek, V. / Bastl, Z. / Subrt, J. / Pola, J.

IR laser induced CVD of SiO~2 phases from triethoxysilane and tetraethoxysilane

Drinek, V. / Bastl, Z. / Subrt, J. / Pola, J.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

IR laser induced CVD of SiO~2 phases from triethoxysilane and tetraethoxysilane

Contributors:

Drinek, V. (author) / Bastl, Z. (author) / Subrt, J. (author) / Pola, J. (author)

Published in:

APPLIED SURFACE SCIENCE ; 108 ; 283-288

Publication date:

1997-01-01

Size:

6 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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