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Formation of a silicate layer between lead oxide and a silicon-wafer surface during heat treatment

Won Gyu Lee / Seong Ihl Woo

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Formation of a silicate layer between lead oxide and a silicon-wafer surface during heat treatment

Won Gyu Lee / Seong Ihl Woo

Formation of a silicate layer between lead oxide and a silicon-wafer surface during heat treatment

Won Gyu Lee / Seong Ihl Woo

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Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Formation of a silicate layer between lead oxide and a silicon-wafer surface during heat treatment

Contributors:

Won Gyu Lee (author) / Seong Ihl Woo (author)

Published in:

JOURNAL OF MATERIALS SCIENCE ; 32 ; 815-820

Publication date:

1997-01-01

Size:

6 pages

ISSN:

0022-2461

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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