SiH~4 and GeH~4 chemical vapor deposition of GeSi/Ge heterostructures: Fid-Bau Portal

SiH~4 and GeH~4 chemical vapor deposition of GeSi/Ge heterostructures

Gu, S. / Zhu, X. / Jiang, N. / Shi, Y. / Zhang, R. / Zheng, Y.

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SiH~4 and GeH~4 chemical vapor deposition of GeSi/Ge heterostructures

Gu, S. / Zhu, X. / Jiang, N. / Shi, Y. / Zhang, R. / Zheng, Y.

SiH~4 and GeH~4 chemical vapor deposition of GeSi/Ge heterostructures

Gu, S. / Zhu, X. / Jiang, N. / Shi, Y. / Zhang, R. / Zheng, Y.

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Check availability in my library

Order at Subito €

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Document information

Title:

SiH~4 and GeH~4 chemical vapor deposition of GeSi/Ge heterostructures

Contributors:

Gu, S. (author) / Zhu, X. (author) / Jiang, N. (author) / Shi, Y. (author) / Zhang, R. (author) / Zheng, Y. (author)

Published in:

APPLIED SURFACE SCIENCE ; 115 ; 28-30

Publication date:

1997-01-01

Size:

3 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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