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Influence of rf substrate bias on properties of reactive sputtered TiAlN films

Shew, B.-Y. / Huang, J.-L. / Lii, D.-F.

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Influence of rf substrate bias on properties of reactive sputtered TiAlN films

Shew, B.-Y. / Huang, J.-L. / Lii, D.-F.

Influence of rf substrate bias on properties of reactive sputtered TiAlN films

Shew, B.-Y. / Huang, J.-L. / Lii, D.-F.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Influence of rf substrate bias on properties of reactive sputtered TiAlN films

Contributors:

Shew, B.-Y. (author) / Huang, J.-L. (author) / Lii, D.-F. (author)

Published in:

SURFACE ENGINEERING -LONDON- ; 13 ; 133-138

Publication date:

1997-01-01

Size:

6 pages

ISSN:

0267-0844

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.44

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