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    Reactive ion etching damage to the electrical properties of ferroelectric thin films

    New search for: Pan, W.
    New search for: Thio, C. L.
    New search for: Desu, S. B.

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    Reactive ion etching damage to the electrical properties of ferroelectric thin films

    New search for: Pan, W.
    New search for: Thio, C. L.
    New search for: Desu, S. B.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Reactive ion etching damage to the electrical properties of ferroelectric thin films

    New search for: Pan, W.
    New search for: Thio, C. L.
    New search for: Desu, S. B.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Reactive ion etching damage to the electrical properties of ferroelectric thin films

    Contributors:

    Pan, W. (author) / Thio, C. L. (author) / Desu, S. B. (author)

    Published in:

    JOURNAL OF MATERIALS RESEARCH -PITTSBURGH- ; 13 ; 362-367

    Publication date:

    1998-01-01

    Size:

    6 pages

    ISSN:

    0884-2914

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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