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Low energy IBAD: correlation between process parameters and film properties for ion beam assisted evaporation and sputter deposition
Low energy IBAD: correlation between process parameters and film properties for ion beam assisted evaporation and sputter deposition
Low energy IBAD: correlation between process parameters and film properties for ion beam assisted evaporation and sputter deposition
Oechsner, H. (author) / Schafft, M. (author) / Schumacher, A. (author) / Wolff, D. (author)
MATERIALWISSENSCHAFT UND WERKSTOFFTECHNIK ; 29 ; 466-475
1998-01-01
10 pages
Article (Journal)
German
DDC:
620.11
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