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Vapor deposition of parylene-F using hydrogen as carrier gas

Mathur, D. / Yang, G.-R. / Lu, T.-M.

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Vapor deposition of parylene-F using hydrogen as carrier gas

Mathur, D. / Yang, G.-R. / Lu, T.-M.

Vapor deposition of parylene-F using hydrogen as carrier gas

Mathur, D. / Yang, G.-R. / Lu, T.-M.

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Vapor deposition of parylene-F using hydrogen as carrier gas

Contributors:

Mathur, D. (author) / Yang, G.-R. (author) / Lu, T.-M. (author)

Published in:

JOURNAL OF MATERIALS RESEARCH -PITTSBURGH- ; 14 ; 246-250

Publication date:

1999-01-01

Size:

5 pages

ISSN:

0884-2914

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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