Ultraviolet laser-induced formation of thin silicon oxide film from the precursor �-chloroethyl silsesquioxane: Fid-Bau Portal

Ultraviolet laser-induced formation of thin silicon oxide film from the precursor -chloroethyl silsesquioxane

Sharma, J. / Berry, D. H. / Composto, R. J. / Dai, H.-L.

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Ultraviolet laser-induced formation of thin silicon oxide film from the precursor -chloroethyl silsesquioxane

Sharma, J. / Berry, D. H. / Composto, R. J. / Dai, H.-L.

Ultraviolet laser-induced formation of thin silicon oxide film from the precursor -chloroethyl silsesquioxane

Sharma, J. / Berry, D. H. / Composto, R. J. / Dai, H.-L.

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Check availability in my library

Order at Subito €

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Document information

Title:

Ultraviolet laser-induced formation of thin silicon oxide film from the precursor -chloroethyl silsesquioxane

Contributors:

Sharma, J. (author) / Berry, D. H. (author) / Composto, R. J. (author) / Dai, H.-L. (author)

Published in:

JOURNAL OF MATERIALS RESEARCH -PITTSBURGH- ; 14 ; 990-994

Publication date:

1999-01-01

Size:

5 pages

ISSN:

0884-2914

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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