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Photopolymerization by evanescent waves: characterization of photopolymerizable formulation for photolithography with nanometric resolution
Photopolymerization by evanescent waves: characterization of photopolymerizable formulation for photolithography with nanometric resolution
Photopolymerization by evanescent waves: characterization of photopolymerizable formulation for photolithography with nanometric resolution
Espanet, A. (author) / Dos Santos, G. (author) / Ecoffet, C. (author) / Lougnot, D. J. (author) / Boyd, I. W. / Perriere, J. / Stuke, M.
1999-01-01
6 pages
Article (Journal)
English
DDC:
621.35
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