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    Colloid monolayer lithography-A flexible approach for nanostructuring of surfaces

    New search for: Burmeister, F.
    New search for: Badowsky, W.
    New search for: Braun, T.
    New search for: Wieprich, S.
    New search for: Boneberg, J.
    New search for: Leiderer, P.

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    Colloid monolayer lithography-A flexible approach for nanostructuring of surfaces

    New search for: Burmeister, F.
    New search for: Badowsky, W.
    New search for: Braun, T.
    New search for: Wieprich, S.
    New search for: Boneberg, J.
    New search for: Leiderer, P.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Colloid monolayer lithography-A flexible approach for nanostructuring of surfaces

    New search for: Burmeister, F.
    New search for: Badowsky, W.
    New search for: Braun, T.
    New search for: Wieprich, S.
    New search for: Boneberg, J.
    New search for: Leiderer, P.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Colloid monolayer lithography-A flexible approach for nanostructuring of surfaces

    Contributors:

    Burmeister, F. (author) / Badowsky, W. (author) / Braun, T. (author) / Wieprich, S. (author) / Boneberg, J. (author) / Leiderer, P. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 144 ; 461-466

    Publication date:

    1999-01-01

    Size:

    6 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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