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Electroless copper deposition solution induced chemical changes in low-k fluorinated dielectrics

Hsu, D.T. / Shi, F.G. / Lopatin, S. / Shacham-Diamand, Y. / Zhao, B. / Brongo, M. / Vasudev, P.K.

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Electroless copper deposition solution induced chemical changes in low-k fluorinated dielectrics

Hsu, D.T. / Shi, F.G. / Lopatin, S. / Shacham-Diamand, Y. / Zhao, B. / Brongo, M. / Vasudev, P.K.

Electroless copper deposition solution induced chemical changes in low-k fluorinated dielectrics

Hsu, D.T. / Shi, F.G. / Lopatin, S. / Shacham-Diamand, Y. / Zhao, B. / Brongo, M. / Vasudev, P.K.

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Document information

Title:

Electroless copper deposition solution induced chemical changes in low-k fluorinated dielectrics

Contributors:

Hsu, D.T. (author) / Shi, F.G. (author) / Lopatin, S. (author) / Shacham-Diamand, Y. (author) / Zhao, B. (author) / Brongo, M. (author) / Vasudev, P.K. (author)

Published in:

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 2 ; 19-22

Publication date:

1999-01-01

Size:

4 pages

ISSN:

1369-8001

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.38152

Hsu, D. T. / Shi, F. G. / Lopatin, S. et al. | British Library Online Contents | 1999

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