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    Oxygen transportation during Czochralski silicon crystal growth

    New search for: Hoshikawa, K.
    New search for: Huang, X.

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    Oxygen transportation during Czochralski silicon crystal growth

    New search for: Hoshikawa, K.
    New search for: Huang, X.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Oxygen transportation during Czochralski silicon crystal growth

    New search for: Hoshikawa, K.
    New search for: Huang, X.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
    Similar titles

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    Document information
    Title:

    Oxygen transportation during Czochralski silicon crystal growth

    Contributors:

    Hoshikawa, K. (author) / Huang, X. (author)

    Published in:

    MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 72 ; 73 - 79

    Publication date:

    2000-01-01

    Size:

    7 pages

    ISSN:

    0921-5107

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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