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    Effect of oxygen concentration on diffusion length in Czochralski and magnetic Czochralski silicon

    New search for: Binetti, S.
    New search for: Acciarri, M.
    New search for: Brianza, A.
    New search for: Savigni, C.

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    Effect of oxygen concentration on diffusion length in Czochralski and magnetic Czochralski silicon

    New search for: Binetti, S.
    New search for: Acciarri, M.
    New search for: Brianza, A.
    New search for: Savigni, C.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Effect of oxygen concentration on diffusion length in Czochralski and magnetic Czochralski silicon

    New search for: Binetti, S.
    New search for: Acciarri, M.
    New search for: Brianza, A.
    New search for: Savigni, C.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

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    Document information
    Title:

    Effect of oxygen concentration on diffusion length in Czochralski and magnetic Czochralski silicon

    Contributors:

    Binetti, S. (author) / Acciarri, M. (author) / Brianza, A. (author) / Savigni, C. (author)

    Published in:

    MATERIALS SCIENCE AND TECHNOLOGY -LONDON- ; 11 ; 665

    Publication date:

    1995-01-01

    Size:

    665 pages

    ISSN:

    0267-0836

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    Unknown

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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