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In-situ control during molecular beam epitaxy: impurity incorporation and dissimilar materials epitaxial growth
In-situ control during molecular beam epitaxy: impurity incorporation and dissimilar materials epitaxial growth
In-situ control during molecular beam epitaxy: impurity incorporation and dissimilar materials epitaxial growth
Daweritz, L. (author) / Wang, Z. M. (author) / Schippan, F. (author) / Trampert, A. (author) / Ploog, K. H. (author)
MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 75 ; 157 - 165
2000-01-01
9 pages
Article (Journal)
English
DDC:
620.11
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