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In-situ control during molecular beam epitaxy: impurity incorporation and dissimilar materials epitaxial growth
In-situ control during molecular beam epitaxy: impurity incorporation and dissimilar materials epitaxial growth
In-situ control during molecular beam epitaxy: impurity incorporation and dissimilar materials epitaxial growth
Daweritz, L. (Autor:in) / Wang, Z. M. (Autor:in) / Schippan, F. (Autor:in) / Trampert, A. (Autor:in) / Ploog, K. H. (Autor:in)
MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 75 ; 157 - 165
01.01.2000
9 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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