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    AlN Epitaxial Films Grown by ECR Plasma Assisted Metalorganic Chemical Vapor Deposition under Controlled Plasma Conditions in Afterglow Region

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    New search for: Hoshino, S.
    New search for: Akahane, T.

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    AlN Epitaxial Films Grown by ECR Plasma Assisted Metalorganic Chemical Vapor Deposition under Controlled Plasma Conditions in Afterglow Region

    New search for: Yasui, K.
    New search for: Hoshino, S.
    New search for: Akahane, T.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    AlN Epitaxial Films Grown by ECR Plasma Assisted Metalorganic Chemical Vapor Deposition under Controlled Plasma Conditions in Afterglow Region

    New search for: Yasui, K.
    New search for: Hoshino, S.
    New search for: Akahane, T.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Document information
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    Document information
    Title:

    AlN Epitaxial Films Grown by ECR Plasma Assisted Metalorganic Chemical Vapor Deposition under Controlled Plasma Conditions in Afterglow Region

    Contributors:

    Yasui, K. (author) / Hoshino, S. (author) / Akahane, T. (author)

    Published in:

    MATERIALS SCIENCE FORUM ; 338/342 ; 1511-1514

    Publication date:

    2000-01-01

    Size:

    4 pages

    ISSN:

    0255-5476

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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