Dynamics of SiO2/SiOx/Si multilayer growth and interfacial effects on silicon quantum well confinement properties: Fid-Bau Portal

Dynamics of SiO2/SiOx/Si multilayer growth and interfacial effects on silicon quantum well confinement properties

da Silva Jr, E. F. / de Vasconcelos, E. A. / Stosic, B. D. / de Sousa, J. S. / Farias, G. A. / Freire, V. N.

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Dynamics of SiO2/SiOx/Si multilayer growth and interfacial effects on silicon quantum well confinement properties

da Silva Jr, E. F. / de Vasconcelos, E. A. / Stosic, B. D. / de Sousa, J. S. / Farias, G. A. / Freire, V. N.

Dynamics of SiO2/SiOx/Si multilayer growth and interfacial effects on silicon quantum well confinement properties

da Silva Jr, E. F. / de Vasconcelos, E. A. / Stosic, B. D. / de Sousa, J. S. / Farias, G. A. / Freire, V. N.

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Document information

Title:

Dynamics of SiO2/SiOx/Si multilayer growth and interfacial effects on silicon quantum well confinement properties

Contributors:

da Silva Jr, E. F. (author) / de Vasconcelos, E. A. (author) / Stosic, B. D. (author) / de Sousa, J. S. (author) / Farias, G. A. (author) / Freire, V. N. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 74 ; 188 - 192

Publication date:

2000-01-01

Size:

5 pages

ISSN:

0921-5107

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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