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Titanium isopropoxide as a precursor for atomic layer deposition: characterization of titanium dioxide growth process

Aarik, J. / Aidla, A. / Uustare, T. / Ritala, M. / Leskela, M.

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Titanium isopropoxide as a precursor for atomic layer deposition: characterization of titanium dioxide growth process

Aarik, J. / Aidla, A. / Uustare, T. / Ritala, M. / Leskela, M.

Titanium isopropoxide as a precursor for atomic layer deposition: characterization of titanium dioxide growth process

Aarik, J. / Aidla, A. / Uustare, T. / Ritala, M. / Leskela, M.

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Document information

Title:

Titanium isopropoxide as a precursor for atomic layer deposition: characterization of titanium dioxide growth process

Contributors:

Aarik, J. (author) / Aidla, A. (author) / Uustare, T. (author) / Ritala, M. (author) / Leskela, M. (author)

Published in:

APPLIED SURFACE SCIENCE ; 161 ; 385-395

Publication date:

2000-01-01

Size:

11 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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