Atomic layer deposition of titanium dioxide from TiCl4 and H2O: investigation of growth mechanism: Fid-Bau Portal

Atomic layer deposition of titanium dioxide from TiCl4 and H2O: investigation of growth mechanism

Aarik, J. / Aidla, A. / Mandar, H. / Uustare, T.

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Atomic layer deposition of titanium dioxide from TiCl4 and H2O: investigation of growth mechanism

Aarik, J. / Aidla, A. / Mandar, H. / Uustare, T.

Atomic layer deposition of titanium dioxide from TiCl4 and H2O: investigation of growth mechanism

Aarik, J. / Aidla, A. / Mandar, H. / Uustare, T.

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Document information

Title:

Atomic layer deposition of titanium dioxide from TiCl4 and H2O: investigation of growth mechanism

Contributors:

Aarik, J. (author) / Aidla, A. (author) / Mandar, H. (author) / Uustare, T. (author)

Published in:

APPLIED SURFACE SCIENCE ; 172 ; 148-158

Publication date:

2001-01-01

Size:

11 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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