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    Inert Gas Atomization of Chemical Grade Silicon

    New search for: Rodrigues, D.
    New search for: Neto, J. B. F.
    New search for: Salgado, L.
    New search for: Nogueira, P. F.
    New search for: Poco, J. G. R.

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    Inert Gas Atomization of Chemical Grade Silicon

    New search for: Rodrigues, D.
    New search for: Neto, J. B. F.
    New search for: Salgado, L.
    New search for: Nogueira, P. F.
    New search for: Poco, J. G. R.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Inert Gas Atomization of Chemical Grade Silicon

    New search for: Rodrigues, D.
    New search for: Neto, J. B. F.
    New search for: Salgado, L.
    New search for: Nogueira, P. F.
    New search for: Poco, J. G. R.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
    Similar titles

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    Document information
    Title:

    Inert Gas Atomization of Chemical Grade Silicon

    Contributors:

    Rodrigues, D. (author) / Neto, J. B. F. (author) / Salgado, L. (author) / Nogueira, P. F. (author) / Poco, J. G. R. (author)

    Published in:

    KEY ENGINEERING MATERIALS ; 276-281

    Publication date:

    2001-01-01

    Size:

    6 pages

    ISSN:

    1013-9826

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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