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Silica film preparation by chemical vapor deposition using vacuum ultraviolet excimer lamps

Kurosawa, K. / Takezoe, N. / Yanagida, H. / Miyano, J. / Motoyama, Y. / Toshikawa, K. / Kawasaki, Y. / Yokotani, A.

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Silica film preparation by chemical vapor deposition using vacuum ultraviolet excimer lamps

Kurosawa, K. / Takezoe, N. / Yanagida, H. / Miyano, J. / Motoyama, Y. / Toshikawa, K. / Kawasaki, Y. / Yokotani, A.

Silica film preparation by chemical vapor deposition using vacuum ultraviolet excimer lamps

Kurosawa, K. / Takezoe, N. / Yanagida, H. / Miyano, J. / Motoyama, Y. / Toshikawa, K. / Kawasaki, Y. / Yokotani, A.

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Check availability in my library

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Document information

Title:

Silica film preparation by chemical vapor deposition using vacuum ultraviolet excimer lamps

Contributors:

Kurosawa, K. (author) / Takezoe, N. (author) / Yanagida, H. (author) / Miyano, J. (author) / Motoyama, Y. (author) / Toshikawa, K. (author) / Kawasaki, Y. (author) / Yokotani, A. (author)

Published in:

APPLIED SURFACE SCIENCE ; 168 ; 37-40

Publication date:

2000-01-01

Size:

4 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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