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Low dielectric constant porous silica films formed by photo-induced sol-gel processing

Zhang, J. Y. / Boyd, I. W.

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Low dielectric constant porous silica films formed by photo-induced sol-gel processing

Zhang, J. Y. / Boyd, I. W.

Low dielectric constant porous silica films formed by photo-induced sol-gel processing

Zhang, J. Y. / Boyd, I. W.

Access

Access via TIB

Check availability in my library

Order at Subito €

Page navigation

Document information

Similar titles

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Document information

Title:

Low dielectric constant porous silica films formed by photo-induced sol-gel processing

Contributors:

Zhang, J. Y. (author) / Boyd, I. W. (author)

Published in:

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 3 ; 345-349

Publication date:

2000-01-01

Size:

5 pages

ISSN:

1369-8001

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.38152

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