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    Low temperature growth of beta-FeSi~2 films on Si(111) by RF magnetron sputtering using a FeSi~2 alloy target

    New search for: Yoshitake, T.
    New search for: Hanada, T.
    New search for: Nagayama, K.

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    Low temperature growth of beta-FeSi~2 films on Si(111) by RF magnetron sputtering using a FeSi~2 alloy target

    New search for: Yoshitake, T.
    New search for: Hanada, T.
    New search for: Nagayama, K.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Low temperature growth of beta-FeSi~2 films on Si(111) by RF magnetron sputtering using a FeSi~2 alloy target

    New search for: Yoshitake, T.
    New search for: Hanada, T.
    New search for: Nagayama, K.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
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    Document information
    Similar titles

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    Document information
    Title:

    Low temperature growth of beta-FeSi~2 films on Si(111) by RF magnetron sputtering using a FeSi~2 alloy target

    Contributors:

    Yoshitake, T. (author) / Hanada, T. (author) / Nagayama, K. (author)

    Published in:

    JOURNAL OF MATERIALS SCIENCE LETTERS ; 19 ; 537-538

    Publication date:

    2000-01-01

    Size:

    2 pages

    ISSN:

    0261-8028

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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