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    Effect of carrier gas in chemical vapor deposition of FeN film using FeCl~3

    New search for: Toda, Y.
    New search for: Takahashi, N.
    New search for: Nakamura, T.
    New search for: Momose, Y.

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    Effect of carrier gas in chemical vapor deposition of FeN film using FeCl~3

    New search for: Toda, Y.
    New search for: Takahashi, N.
    New search for: Nakamura, T.
    New search for: Momose, Y.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Effect of carrier gas in chemical vapor deposition of FeN film using FeCl~3

    New search for: Toda, Y.
    New search for: Takahashi, N.
    New search for: Nakamura, T.
    New search for: Momose, Y.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

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    Document information
    Title:

    Effect of carrier gas in chemical vapor deposition of FeN film using FeCl~3

    Contributors:

    Toda, Y. (author) / Takahashi, N. (author) / Nakamura, T. (author) / Momose, Y. (author)

    Published in:

    JOURNAL OF MATERIALS SCIENCE LETTERS ; 19 ; 1303-1304

    Publication date:

    2000-01-01

    Size:

    2 pages

    ISSN:

    0261-8028

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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