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Effect of carrier gas in chemical vapor deposition of FeN film using FeCl~3
Effect of carrier gas in chemical vapor deposition of FeN film using FeCl~3
Effect of carrier gas in chemical vapor deposition of FeN film using FeCl~3
Toda, Y. (Autor:in) / Takahashi, N. (Autor:in) / Nakamura, T. (Autor:in) / Momose, Y. (Autor:in)
JOURNAL OF MATERIALS SCIENCE LETTERS ; 19 ; 1303-1304
01.01.2000
2 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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