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Proton trapping and diffusion in SiO2 thin films: a first-principles study

Zhang, Q. / Tang, S. / Wallace, R. M.

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Proton trapping and diffusion in SiO2 thin films: a first-principles study

Zhang, Q. / Tang, S. / Wallace, R. M.

Proton trapping and diffusion in SiO2 thin films: a first-principles study

Zhang, Q. / Tang, S. / Wallace, R. M.

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Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Proton trapping and diffusion in SiO2 thin films: a first-principles study

Contributors:

Zhang, Q. (author) / Tang, S. (author) / Wallace, R. M. (author)

Published in:

APPLIED SURFACE SCIENCE ; 172 ; 41-46

Publication date:

2001-01-01

Size:

6 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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