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A Novel Single-Component Negative Resist for DUV and Electron Beam Lithography

Wu, H. / Gonsalves, K. E.

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A Novel Single-Component Negative Resist for DUV and Electron Beam Lithography

Wu, H. / Gonsalves, K. E.

A Novel Single-Component Negative Resist for DUV and Electron Beam Lithography

Wu, H. / Gonsalves, K. E.

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

A Novel Single-Component Negative Resist for DUV and Electron Beam Lithography

Contributors:

Wu, H. (author) / Gonsalves, K. E. (author)

Published in:

ADVANCED MATERIALS -DEERFIELD BEACH THEN WEINHEIM- ; 13 ; 195-197

Publication date:

2001-01-01

Size:

3 pages

ISSN:

0935-9648

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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