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Dopant based electron beam lithography in CuxTiSe2

Kidd, T. E. / Klein, D. / Rash, T. A. / Strauss, L. H.

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Dopant based electron beam lithography in CuxTiSe2

Kidd, T. E. / Klein, D. / Rash, T. A. / Strauss, L. H.

Dopant based electron beam lithography in CuxTiSe2

Kidd, T. E. / Klein, D. / Rash, T. A. / Strauss, L. H.

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Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Dopant based electron beam lithography in CuxTiSe2

Contributors:

Kidd, T. E. (author) / Klein, D. (author) / Rash, T. A. (author) / Strauss, L. H. (author)

Published in:

APPLIED SURFACE SCIENCE ; 257 ; 3812-3816

Publication date:

2011-01-01

Size:

5 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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