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Nitridation of Silicon Oxide Layers Studied with Ion Beam Analysis on the Nanometer Scale

Markwitz, A. / White, G. V.

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Nitridation of Silicon Oxide Layers Studied with Ion Beam Analysis on the Nanometer Scale

Markwitz, A. / White, G. V.

Nitridation of Silicon Oxide Layers Studied with Ion Beam Analysis on the Nanometer Scale

Markwitz, A. / White, G. V.

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Nitridation of Silicon Oxide Layers Studied with Ion Beam Analysis on the Nanometer Scale

Contributors:

Markwitz, A. (author) / White, G. V. (author)

Published in:

ADVANCED MATERIALS -DEERFIELD BEACH THEN WEINHEIM- ; 13 ; 1027-1030

Publication date:

2001-01-01

Size:

4 pages

ISSN:

0935-9648

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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