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    Low energy plasma enhanced chemical vapor deposition

    New search for: Kummer, M.
    New search for: Rosenblad, C.
    New search for: Dommann, A.
    New search for: Hackbarth, T.
    New search for: Hock, G.
    New search for: Zeuner, M.
    New search for: Muller, E.
    New search for: von Kanel, H.

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    Low energy plasma enhanced chemical vapor deposition

    New search for: Kummer, M.
    New search for: Rosenblad, C.
    New search for: Dommann, A.
    New search for: Hackbarth, T.
    New search for: Hock, G.
    New search for: Zeuner, M.
    New search for: Muller, E.
    New search for: von Kanel, H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Low energy plasma enhanced chemical vapor deposition

    New search for: Kummer, M.
    New search for: Rosenblad, C.
    New search for: Dommann, A.
    New search for: Hackbarth, T.
    New search for: Hock, G.
    New search for: Zeuner, M.
    New search for: Muller, E.
    New search for: von Kanel, H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Low energy plasma enhanced chemical vapor deposition

    Contributors:

    Kummer, M. (author) / Rosenblad, C. (author) / Dommann, A. (author) / Hackbarth, T. (author) / Hock, G. (author) / Zeuner, M. (author) / Muller, E. (author) / von Kanel, H. (author)

    Published in:

    MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 89 ; 288 - 295

    Publication date:

    2002-01-01

    Size:

    8 pages

    ISSN:

    0921-5107

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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