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    Preparation and Properties of SiO~2 Thin Films Derived from Polysilanes Treated with Oxygen Plasma

    New search for: Peng, Z. J.
    New search for: Si, W. J.
    New search for: Xie, M. N.
    New search for: Fu, H. J.
    New search for: Lin, S. W.
    New search for: Miao, H. Z.
    New search for: Gong, J.
    New search for: Pan, W.

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    Preparation and Properties of SiO~2 Thin Films Derived from Polysilanes Treated with Oxygen Plasma

    New search for: Peng, Z. J.
    New search for: Si, W. J.
    New search for: Xie, M. N.
    New search for: Fu, H. J.
    New search for: Lin, S. W.
    New search for: Miao, H. Z.
    New search for: Gong, J.
    New search for: Pan, W.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Preparation and Properties of SiO~2 Thin Films Derived from Polysilanes Treated with Oxygen Plasma

    New search for: Peng, Z. J.
    New search for: Si, W. J.
    New search for: Xie, M. N.
    New search for: Fu, H. J.
    New search for: Lin, S. W.
    New search for: Miao, H. Z.
    New search for: Gong, J.
    New search for: Pan, W.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

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    Document information
    Title:

    Preparation and Properties of SiO~2 Thin Films Derived from Polysilanes Treated with Oxygen Plasma

    Contributors:

    Peng, Z. J. (author) / Si, W. J. (author) / Xie, M. N. (author) / Fu, H. J. (author) / Lin, S. W. (author) / Miao, H. Z. (author) / Gong, J. / Pan, W.

    Published in:

    High-Performance Ceramics 2001 ; 219-224

    KEY ENGINEERING MATERIALS

    Publication date:

    2002-01-01

    Size:

    6 pages

    ISSN:

    1013-9826

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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