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Effects of postdeposition in situ heat treatment on the properties of low dielectric constant plasma polymer films deposited using decahydronaphthalene and tetraethyl orthosilicate as the precursors
Effects of postdeposition in situ heat treatment on the properties of low dielectric constant plasma polymer films deposited using decahydronaphthalene and tetraethyl orthosilicate as the precursors
Effects of postdeposition in situ heat treatment on the properties of low dielectric constant plasma polymer films deposited using decahydronaphthalene and tetraethyl orthosilicate as the precursors
JOURNAL OF MATERIALS RESEARCH -PITTSBURGH- ; 17 ; 1371-1375
2002-01-01
5 pages
Article (Journal)
English
DDC:
620.11
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